Open Source NoC IP-The Significance of Wenyuhe Release

2024-06-13 09:20 協積實業

Beijing Kaixin Institute officially released the world's first open source large-scale

Internet-on-Chip (NoC) IP - Wenyuhe on May 21, 2024. This major breakthrough marks a

solid step taken by Kaixin Institute in promoting the development of data center server

chip technology. It is understood that the development of Wenyu River will begin in 2022

and has received support from many companies. At the same time, the research and

development of the second-generation NoC IP has also started, and subsequent products

will provide closer adaptation and optimization for the "Xiangshan" RISC-V core, and

better support the interconnection and expansion of AI accelerators.


Wenyuhe not only achieved the world's first open source NoC IP, but also realized the

development and verification of 64-core interconnection. Bao Yungang, deputy director

of the Institute of Computing Technology of the Chinese Academy of Sciences, also

demonstrated the use of "Wenyuhe" on the FPGA platform to interconnect 16 RISC-V cores,

load Linux and run multiple programs.


旋風非接觸除塵設備

The release of Wen Yuhe is not only a pioneering work in open source chip design, but

also provides confidence in creating more server chips based on RISC-V architecture.

There are currently very few RISC-V server chips on the market that can be named, but

server chips based on the Arm architecture are springing up like mushrooms after a rain,

and the designers are all giant cloud service manufacturers. After the release of Wenyuhe,

not only the open source core has benefited, but also many commercial IP manufacturers.

In the future, ultra-multi-core RISC-V server chips will have one less design barrier.


Whether it is the release of Wenyuhe or other high-precision products, precision dust

removal is required during the research and development process, such as wafers, chips,

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cleanliness, increasing yield, reducing labor, and increasing efficiency. If you are interested,

please contact Xieji Industrial.



Xieji Industrial (Shanghai) Co., LTD
Reducing labor and improving yield mainly addresses issues such as Partical(microorganisms, micro-particles, and micro-dust) in special process sections, critical process sections, and wafer exposure process sections of ultra-precision equipment
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